Thin Film Depostion

UHV thin film deposition system with three sputter guns and an electron-beam evaporation source. The system is intended for the production of high quality low-T_c superconducting thin films and multilayer materials. The load lock is oxygen compatible for use in Nb/Al₂O₃/Nb trilayers, and the sample holder can rotate at speeds up to 6 Hz for amorphous superconductor thin film deposition. This system was obtained with matching money from the NSF Academic Research Infrastructure program (NSF-DMR-9214579).

We wish to acknowledge the NSF Division of Materials Research for supporting this research under NSF MRSEC DMR 9632521 and the NSF Division of Electrical and Communication Systems for supporting this research under NSF ECS 9632811. We also acknowledge support from the Maryland MIPS program and the DARPA TASS program.

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Center for Superconductivity Research, University of Maryland, College Park, MD 20742-4111
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